Surface observation method

This surface observation method comprises a step (a) and a step (b). In the step (a), materials including one or more kinds of solid light-emitting dye molecules are accumulated in a region, of a substrate or a structure on the substrate, having an abnormal shape. In the step (b), a fluorescent imag...

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Bibliographische Detailangaben
Hauptverfasser:	SHIMURA, SATORU, OOWADA, SHIN, TANAKA, KAZUO, CHUJO, YOSHIKI, YUHARA, KAZUHIRO, ITO, SHUNICHIRO, ASAKO, RYUICHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	This surface observation method comprises a step (a) and a step (b). In the step (a), materials including one or more kinds of solid light-emitting dye molecules are accumulated in a region, of a substrate or a structure on the substrate, having an abnormal shape. In the step (b), a fluorescent image of the solid light-emitting dye molecules is acquired by applying illumination light to the region, of the substrate or the structure on the substrate, having the abnormal shape.