Reducing particle buildup in processing chambers
Systems and methods for operating a deposition tool are provided. In one aspect, the method includes processing a substrate in a processing chamber including a ceramic showerhead and a coating. The coating includes material deposited in the processing chamber. The ceramic showerhead is heated to a p...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | Systems and methods for operating a deposition tool are provided. In one aspect, the method includes processing a substrate in a processing chamber including a ceramic showerhead and a coating. The coating includes material deposited in the processing chamber. The ceramic showerhead is heated to a processing temperature during the processing of the substrate. The method further includes performing a cleaning process to remove the coating by introducing a reactive cleaning species into the processing chamber while flowing a purge gas through the ceramic showerhead and by heating the ceramic showerhead to a bake-out temperature above the processing temperature to remove at least some aluminum fluoride particles generated during the cleaning process. The method further includes applying a new coating to the processing chamber. |
---|