Reducing particle buildup in processing chambers

Systems and methods for operating a deposition tool are provided. In one aspect, the method includes processing a substrate in a processing chamber including a ceramic showerhead and a coating. The coating includes material deposited in the processing chamber. The ceramic showerhead is heated to a p...

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Bibliographische Detailangaben
Hauptverfasser: HENRI, BRANDT, HUANG, YAN-HUI, HU, XING-YI, BEAUDETTE, CHAD ADRIEN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Systems and methods for operating a deposition tool are provided. In one aspect, the method includes processing a substrate in a processing chamber including a ceramic showerhead and a coating. The coating includes material deposited in the processing chamber. The ceramic showerhead is heated to a processing temperature during the processing of the substrate. The method further includes performing a cleaning process to remove the coating by introducing a reactive cleaning species into the processing chamber while flowing a purge gas through the ceramic showerhead and by heating the ceramic showerhead to a bake-out temperature above the processing temperature to remove at least some aluminum fluoride particles generated during the cleaning process. The method further includes applying a new coating to the processing chamber.