Method for fabricating electrode and semiconductor device including the same

A method for fabricating an electrode may include: forming a carbon layer; performing an ion beam etch process to planarize and harden a surface of the carbon layer on the carbon layer; and performing an impurity doping process to dope an impurity into the carbon layer.

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Bibliographische Detailangaben
Hauptverfasser: KIM, JEONG-MYEONG, CHOI, KEO-ROCK, DONG, CHA-DEOK
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A method for fabricating an electrode may include: forming a carbon layer; performing an ion beam etch process to planarize and harden a surface of the carbon layer on the carbon layer; and performing an impurity doping process to dope an impurity into the carbon layer.