Method for fabricating electrode and semiconductor device including the same
A method for fabricating an electrode may include: forming a carbon layer; performing an ion beam etch process to planarize and harden a surface of the carbon layer on the carbon layer; and performing an impurity doping process to dope an impurity into the carbon layer.
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A method for fabricating an electrode may include: forming a carbon layer; performing an ion beam etch process to planarize and harden a surface of the carbon layer on the carbon layer; and performing an impurity doping process to dope an impurity into the carbon layer. |
---|