Phase-resolved optical metrology for substrates

Phase-resolved optical metrology for substrates

The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate.

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Hauptverfasser: SRIVATSA, ARUN RAMASWAMY, JIANG, ZHIMING, ZHANG, XIAO-DONG, SALEH, NEDAL
Format: Patent
Sprache:chi ; eng
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INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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creator SRIVATSA, ARUN RAMASWAMY
JIANG, ZHIMING
ZHANG, XIAO-DONG
SALEH, NEDAL
description The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate.
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title Phase-resolved optical metrology for substrates
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