Phase-resolved optical metrology for substrates

The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate.

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Bibliographische Detailangaben
Hauptverfasser: SRIVATSA, ARUN RAMASWAMY, JIANG, ZHIMING, ZHANG, XIAO-DONG, SALEH, NEDAL
Format: Patent
Sprache:chi ; eng
Schlagworte:
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Beschreibung
Zusammenfassung:The methods and apparatus provide phase-resolved optical metrology for determining qualities of a substrate and films thereon. Transmitted and reflected signals are coupled using both amplitude and phase information to improve the metrology information obtained from film layers on the substrate.