Cleaning composition and method of cleaning carbon-containing film using the same

The present invention relates to a cleaning composition comprising a solvent, a surfactant, and an oxidizing agent. The oxidizing agent included in the cleaning composition of the present invention oxidizes at least a portion of surfaces of a carbon-containing film and contaminants derived therefrom...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: PAIK, UN-GYU, SONG, TAE-SEUP, LEE, GANG-GYU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention relates to a cleaning composition comprising a solvent, a surfactant, and an oxidizing agent. The oxidizing agent included in the cleaning composition of the present invention oxidizes at least a portion of surfaces of a carbon-containing film and contaminants derived therefrom, thereby forming hydrophilic bonds including oxygen, and consequently weakens hydrophobic-hydrophobic bonds between the film and contaminants and reduces the viscosity of the composition, thus having the effects of improving the flow of a cleaning process and enhancing cleaning efficiency. In addition, the surfactant included in the cleaning composition of the present invention can form strong hydrophobic bonds with other portions of the surfaces of the carbon-containing film and contaminants derived therefrom to impart repellence between the film and contaminants, and thus has the effect of increasing cleaning efficiency.