Thick film chemically amplified positive type resist composition and method for manufacturing resist film using the same

Provided is a thick film chemically amplified positive type resist composition. A thick film chemically amplified positive type resist composition comprising a certain alkali-soluble resin (A), a photoacid generator (B), and a certain solvent (C).

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Bibliographische Detailangaben
Hauptverfasser:	HAMA, YUSUKE, SAO, TAKAYUKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided is a thick film chemically amplified positive type resist composition. A thick film chemically amplified positive type resist composition comprising a certain alkali-soluble resin (A), a photoacid generator (B), and a certain solvent (C).