Process kit for a substrate support

Methods and apparatus for processing substrates are provided herein. In some embodiments, a process kit for a substrate support includes: an upper edge ring made of quartz and having an upper surface and a lower surface, wherein the upper surface is substantially planar and the lower surface include...

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Bibliographische Detailangaben
Hauptverfasser: CALDERON, VICTOR H, RASHEED, MUHAMMAD M, MUSTAFA, MUHANNAD, LEE, YUNG-HSIN, TOH, SHI WEI, SEN, ANINDITA, BANTHIA, VIKASH, LEI, YU, GELATOS, AVGERINOS V
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Methods and apparatus for processing substrates are provided herein. In some embodiments, a process kit for a substrate support includes: an upper edge ring made of quartz and having an upper surface and a lower surface, wherein the upper surface is substantially planar and the lower surface includes a stepped lower surface to define a radially outermost portion and a radially innermost portion of the upper edge ring.