Overlay measurement for a semiconductor specimen

There is provided a system and method of determining an overlay measurement between a first layer and a second layer of a specimen. The method includes acquiring a first image of a first structure on the first layer and a second image of a second structure on the second layer, obtaining one or more...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ADEL, MICHAEL ELLIOT, BEN-SHLOMO, TAL, ALUMOTOR, KAPLAN, VLADISLAV, FUCHS, DAN TUVIA, ABRAMOVITZ, YANIV
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CALCULATING COMPUTING COUNTING IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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