Piecewise functional fitting of substrate profiles for process learning

A method includes receiving, by a processing device, data indicative of a plurality of measurements of a profile of a substrate. The method further includes separating the data into a plurality of sets of data, a first set of the plurality of sets associated with a first region of the profile, and a...

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Hauptverfasser:	NURANI, RAMAN KRISHNAN, SETHURAMAN, ANANTHA R, BARAI, SAMIT, SUNDAR, BHARATH RAM
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CALCULATING COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS COMPUTING COUNTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A method includes receiving, by a processing device, data indicative of a plurality of measurements of a profile of a substrate. The method further includes separating the data into a plurality of sets of data, a first set of the plurality of sets associated with a first region of the profile, and a second set of the plurality of sets associated with a second region of the profile. The method further includes fitting data of the first set to a first function to generate a first fit function. The first function is selected from a library of functions. The method further includes fitting data of the second set to a second function to generate a second fit function. The method further includes generating a piecewise functional fit of the profile of the substrate. The piecewise functional fit includes the first fit function and the second fit function.