Nano-twinned ultrathin metallic film structure and methods for forming the same
A nano-twinned ultrathin metallic film structure is provided, including: a substrate; and a nano-twinned metallic film on the surface of the substrate, wherein the nano-twinned metallic film has a thickness of 0.5[mu]m to 3[mu]m, and the nano-twinned metallic film has a transition layer near the sub...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A nano-twinned ultrathin metallic film structure is provided, including: a substrate; and a nano-twinned metallic film on the surface of the substrate, wherein the nano-twinned metallic film has a thickness of 0.5[mu]m to 3[mu]m, and the nano-twinned metallic film has a transition layer near the substrate and a twin layer away from the substrate, the twin layer accounts for at least 70% of the thickness of the nano-twinned metallic film, and has a parallel-arranged twin boundary, and the parallel-arranged twin boundary includes more than 50% (111) crystal orientation, wherein the nano-twinned metallic film includes silver, copper, gold, palladium or nickel. The nano-twinned ultrathin metallic structure is formed by activating the substrate surface by ion beam bombardment, followed by performing a sputtering process on the activated substrate surface with a substrate bias. |
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