Processing method of processing apparatus and processing system

A processing method of a processing apparatus including step 1, step 2, step 3, and step 4 is provided. The step 1 is providing an object having a processed surface and dividing the processed surface into a plurality of processed areas, wherein there is at least one workpiece on each of the processe...

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Bibliographische Detailangaben
Hauptverfasser: LIN, CHANG-RONG, LIN, CHING-LIANG
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A processing method of a processing apparatus including step 1, step 2, step 3, and step 4 is provided. The step 1 is providing an object having a processed surface and dividing the processed surface into a plurality of processed areas, wherein there is at least one workpiece on each of the processed areas. The step 2 is performing path computation according to the at least one workpiece of each of the processed areas to generate a processing path in each of the processed areas, wherein the processing paths of the processed areas are different from each other. The step 3 is performing processing operation by a processing apparatus according to the processing path of one of the processed areas obtained from the step 2. The step 4 is moving the processing apparatus to a next processed area after finishing processing operation of all of the at least one workpiece in the one of the processed areas. A processing system is also provided.