Ferroelectric structure, integrated circuit, and method for forming the same

In some embodiments, the present disclosure relates to an integrated circuit (IC) in which a memory structure comprises an inhibition layer inserted between two ferroelectric layers to create a tetragonal-phase dominant ferroelectric structure. In some embodiments, the ferroelectric structure includ...

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Bibliographische Detailangaben
Hauptverfasser: LIN, PO-TING, WU, YIN-HAO, TSAI, WU-WEI, HSIANG, YU-MING, LIN, CHUNG-TE, CHEN, HAIING, LIN, YU-MING, WEN, WEIIH
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:In some embodiments, the present disclosure relates to an integrated circuit (IC) in which a memory structure comprises an inhibition layer inserted between two ferroelectric layers to create a tetragonal-phase dominant ferroelectric structure. In some embodiments, the ferroelectric structure includes a first ferroelectric layer, a second ferroelectric layer overlying the first ferroelectric layer, and a first inhibition layer disposed between the first and second ferroelectric layers and bordering the second ferroelectric layer. The first inhibition layer is a different material than the first and second ferroelectric layers.