Parasitic plasma suppressor

A parasitic plasma suppressor configured to suppress (or at least reduce) the generation of parasitic plasma outside an intended region, such as suppress the generation of parasitic plasma in areas adjacent a pedestal in a processing chamber of a plasma-enhanced processing system.

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Bibliographische Detailangaben
Hauptverfasser:	JAFARIAN-TEHRANI, SAM, CHENG, WEI-FENG, BRENINGER, ANDREW H, FRENCH, DAVID, MARTIN, KEITH JOSEPH, BABBAR, YOGESH, SAKIYAMA, YUKINORI, BAILEY, CURTIS W
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	A parasitic plasma suppressor configured to suppress (or at least reduce) the generation of parasitic plasma outside an intended region, such as suppress the generation of parasitic plasma in areas adjacent a pedestal in a processing chamber of a plasma-enhanced processing system.