Liquid discharge apparatus, method for controlling liquid discharge apparatus, substrate processing apparatus and article manufacturing method advantageous for reducing liquid consumption when cleaning a surface provided with a liquid discharge port

The present invention provides a liquid discharge apparatus, a control method thereof, a substrate processing device, and an article manufacturing method, so as to provide a technology that is advantageous for reducing liquid consumption when cleaning a surface provided with a liquid discharge port....

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Bibliographische Detailangaben
Hauptverfasser: YAMAMOTO, TETSUYA, KURI, MASAHIRO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention provides a liquid discharge apparatus, a control method thereof, a substrate processing device, and an article manufacturing method, so as to provide a technology that is advantageous for reducing liquid consumption when cleaning a surface provided with a liquid discharge port. The liquid discharge apparatus includes a discharge head having a surface provided with a discharge port for discharging a liquid, a storage part for storing the liquid, and a flow passage communicating from the discharge port to the storage part; a control part for controlling the pressure in the storage part; and a cleaning part for sucking the liquid adhering to the surface from the suction port while moving the suction port along the surface, so as to perform a cleaning process on the surface. In the cleaning process, the control part controls the pressure in the storage part based on a first force acting on the liquid in the flow passage caused by the suction force of the suction port, so as to maintain a pos