Semiconductor cleaning agent composition

The purpose of the present invention is to provide a semiconductor cleaning agent composition that exhibits high removal performance with respect to ceria particles which are metal residue remaining on a substrate. The present invention is a semiconductor cleaning agent composition comprising a pH a...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	HARIGAE, TAKAKO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES BASIC ELECTRIC ELEMENTS CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SEMICONDUCTOR DEVICES SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
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Beschreibung
Zusammenfassung:	The purpose of the present invention is to provide a semiconductor cleaning agent composition that exhibits high removal performance with respect to ceria particles which are metal residue remaining on a substrate. The present invention is a semiconductor cleaning agent composition comprising a pH adjuster and a polymer that has a structural unit derived from a carboxylic acid-based monomer, wherein the weight-average molecular weight of the polymer is not less than 3,100, the pH adjuster is one or more compounds selected from the group consisting of metal hydroxides and amine compounds, and pH is not less than 7.