Substrate processing method and substrate processing device
This substrate processing method comprises: holding a substrate horizontally and rotating the substrate; supplying, onto a hydrophobic surface of the rotating substrate, a hydrophilizing solution containing a hydrogen peroxide solution or ozone water; and supplying, after the hydrophilizing solution...
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | This substrate processing method comprises: holding a substrate horizontally and rotating the substrate; supplying, onto a hydrophobic surface of the rotating substrate, a hydrophilizing solution containing a hydrogen peroxide solution or ozone water; and supplying, after the hydrophilizing solution is supplied, a mixed solution of sulfuric acid and hydrogen peroxide solution onto the surface of the rotating substrate. |
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