Source selection module and associated metrology and lithographic apparatuses

Disclosed is a source selection module for selecting spectral characteristics of a broadband illumination beam to obtain a modulated illumination beam. The source selection module comprises a first beam dispersing element for dispersing the beam along a first direction, a second beam dispersing elem...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: EURLINGS, MARKUS FRANCISCUS ANTONIUS, VAN VOORST, PETER DANNY, BASELMANS, JOHANNES JACOBUS MATHEUS, ZHOU, ZI-LI, VAN GREEVENBROEK, HENDRIKUS ROBERTUS MARIE
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Disclosed is a source selection module for selecting spectral characteristics of a broadband illumination beam to obtain a modulated illumination beam. The source selection module comprises a first beam dispersing element for dispersing the beam along a first direction, a second beam dispersing element for dispersing the beam along a second direction perpendicular to said first direction, a controllable diffractive element being operable to controllably spatially modulate the broadband illumination beam subsequent to being dispersed by said first beam dispersing element and said second beam dispersing element; and an aperture stop being operable to maximize transmission of one of specularly reflected radiation and diffracted radiation from said controllable diffractive element and minimize transmission of the other of said specularly reflected radiation and diffracted radiation.