Substrate processing device and substrate processing method
The present invention describes a substrate processing device and a substrate processing method capable of evaluating the quality of the surface state of a substrate and the state of the substrate processing device while detecting the coating state of the surface of the substrate by a process liquid...
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| creator | MARUMOTO, HIROSHI |
| description | The present invention describes a substrate processing device and a substrate processing method capable of evaluating the quality of the surface state of a substrate and the state of the substrate processing device while detecting the coating state of the surface of the substrate by a process liquid. The substrate processing device executes processing which rotates a substrate by controlling a rotatable holding section, processing which supplies a process liquid to the surface of the rotating substrate by controlling a supply section, processing which detects the arrival of the process liquid at a first irradiation location based on a change in the intensity of reflected light acquired by a first optical sensor at the first irradiation location, processing which detects the arrival of the process liquid at a second irradiation location based on a change in the intensity of reflected light acquired by a second optical sensor at the second irradiation location, processing which calculates the rate of spread of |
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The substrate processing device executes processing which rotates a substrate by controlling a rotatable holding section, processing which supplies a process liquid to the surface of the rotating substrate by controlling a supply section, processing which detects the arrival of the process liquid at a first irradiation location based on a change in the intensity of reflected light acquired by a first optical sensor at the first irradiation location, processing which detects the arrival of the process liquid at a second irradiation location based on a change in the intensity of reflected light acquired by a second optical sensor at the second irradiation location, processing which calculates the rate of spread of</description><language>chi ; eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SEMICONDUCTOR DEVICES ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240201&DB=EPODOC&CC=TW&NR=202405893A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240201&DB=EPODOC&CC=TW&NR=202405893A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MARUMOTO, HIROSHI</creatorcontrib><title>Substrate processing device and substrate processing method</title><description>The present invention describes a substrate processing device and a substrate processing method capable of evaluating the quality of the surface state of a substrate and the state of the substrate processing device while detecting the coating state of the surface of the substrate by a process liquid. 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| language | chi ; eng |
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| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
| title | Substrate processing device and substrate processing method |
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