Substrate processing device and substrate processing method

The present invention describes a substrate processing device and a substrate processing method capable of evaluating the quality of the surface state of a substrate and the state of the substrate processing device while detecting the coating state of the surface of the substrate by a process liquid...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: MARUMOTO, HIROSHI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present invention describes a substrate processing device and a substrate processing method capable of evaluating the quality of the surface state of a substrate and the state of the substrate processing device while detecting the coating state of the surface of the substrate by a process liquid. The substrate processing device executes processing which rotates a substrate by controlling a rotatable holding section, processing which supplies a process liquid to the surface of the rotating substrate by controlling a supply section, processing which detects the arrival of the process liquid at a first irradiation location based on a change in the intensity of reflected light acquired by a first optical sensor at the first irradiation location, processing which detects the arrival of the process liquid at a second irradiation location based on a change in the intensity of reflected light acquired by a second optical sensor at the second irradiation location, processing which calculates the rate of spread of