Substrate support and lithographic apparatus

A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first op...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ROSET, NIEK JACOBUS JOHANNES, RAVENSBERGEN, SIMON KAREL, SEEGER, THILO NILS MARTIN, PONTONI, DANIEL, HUIBERTS, JOY, HUANG, ZHUANG-XIONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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