Substrate support and lithographic apparatus

A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first op...

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Bibliographische Detailangaben
Hauptverfasser: ROSET, NIEK JACOBUS JOHANNES, RAVENSBERGEN, SIMON KAREL, SEEGER, THILO NILS MARTIN, PONTONI, DANIEL, HUIBERTS, JOY, HUANG, ZHUANG-XIONG
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first opening; a second opening in fluid communication with ambient pressure and radially outwards of the second circumferential wall; a third circumferential wall radially outwards of the second opening; a third opening radially outwards of the third circumferential wall and configured to extract fluid; and a fourth circumferential wall radially outwards of the third opening.