Substrate support and lithographic apparatus
A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first op...
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| creator | ROSET, NIEK JACOBUS JOHANNES RAVENSBERGEN, SIMON KAREL SEEGER, THILO NILS MARTIN PONTONI, DANIEL HUIBERTS, JOY HUANG, ZHUANG-XIONG |
| description | A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first opening; a second opening in fluid communication with ambient pressure and radially outwards of the second circumferential wall; a third circumferential wall radially outwards of the second opening; a third opening radially outwards of the third circumferential wall and configured to extract fluid; and a fourth circumferential wall radially outwards of the third opening. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_TW202405578A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>TW202405578A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_TW202405578A3</originalsourceid><addsrcrecordid>eNrjZNAJLk0qLilKLElVKC4tKMgvKlFIzEtRyMksychPL0osyMhMVkgsKEgEqigt5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8SHhRgZGJgampuYWjsbEqAEA4nIqpQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate support and lithographic apparatus</title><source>esp@cenet</source><creator>ROSET, NIEK JACOBUS JOHANNES ; RAVENSBERGEN, SIMON KAREL ; SEEGER, THILO NILS MARTIN ; PONTONI, DANIEL ; HUIBERTS, JOY ; HUANG, ZHUANG-XIONG</creator><creatorcontrib>ROSET, NIEK JACOBUS JOHANNES ; RAVENSBERGEN, SIMON KAREL ; SEEGER, THILO NILS MARTIN ; PONTONI, DANIEL ; HUIBERTS, JOY ; HUANG, ZHUANG-XIONG</creatorcontrib><description>A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first opening; a second opening in fluid communication with ambient pressure and radially outwards of the second circumferential wall; a third circumferential wall radially outwards of the second opening; a third opening radially outwards of the third circumferential wall and configured to extract fluid; and a fourth circumferential wall radially outwards of the third opening.</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240201&DB=EPODOC&CC=TW&NR=202405578A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25555,76308</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240201&DB=EPODOC&CC=TW&NR=202405578A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ROSET, NIEK JACOBUS JOHANNES</creatorcontrib><creatorcontrib>RAVENSBERGEN, SIMON KAREL</creatorcontrib><creatorcontrib>SEEGER, THILO NILS MARTIN</creatorcontrib><creatorcontrib>PONTONI, DANIEL</creatorcontrib><creatorcontrib>HUIBERTS, JOY</creatorcontrib><creatorcontrib>HUANG, ZHUANG-XIONG</creatorcontrib><title>Substrate support and lithographic apparatus</title><description>A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first opening; a second opening in fluid communication with ambient pressure and radially outwards of the second circumferential wall; a third circumferential wall radially outwards of the second opening; a third opening radially outwards of the third circumferential wall and configured to extract fluid; and a fourth circumferential wall radially outwards of the third opening.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAJLk0qLilKLElVKC4tKMgvKlFIzEtRyMksychPL0osyMhMVkgsKEgEqigt5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8SHhRgZGJgampuYWjsbEqAEA4nIqpQ</recordid><startdate>20240201</startdate><enddate>20240201</enddate><creator>ROSET, NIEK JACOBUS JOHANNES</creator><creator>RAVENSBERGEN, SIMON KAREL</creator><creator>SEEGER, THILO NILS MARTIN</creator><creator>PONTONI, DANIEL</creator><creator>HUIBERTS, JOY</creator><creator>HUANG, ZHUANG-XIONG</creator><scope>EVB</scope></search><sort><creationdate>20240201</creationdate><title>Substrate support and lithographic apparatus</title><author>ROSET, NIEK JACOBUS JOHANNES ; RAVENSBERGEN, SIMON KAREL ; SEEGER, THILO NILS MARTIN ; PONTONI, DANIEL ; HUIBERTS, JOY ; HUANG, ZHUANG-XIONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_TW202405578A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>ROSET, NIEK JACOBUS JOHANNES</creatorcontrib><creatorcontrib>RAVENSBERGEN, SIMON KAREL</creatorcontrib><creatorcontrib>SEEGER, THILO NILS MARTIN</creatorcontrib><creatorcontrib>PONTONI, DANIEL</creatorcontrib><creatorcontrib>HUIBERTS, JOY</creatorcontrib><creatorcontrib>HUANG, ZHUANG-XIONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ROSET, NIEK JACOBUS JOHANNES</au><au>RAVENSBERGEN, SIMON KAREL</au><au>SEEGER, THILO NILS MARTIN</au><au>PONTONI, DANIEL</au><au>HUIBERTS, JOY</au><au>HUANG, ZHUANG-XIONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate support and lithographic apparatus</title><date>2024-02-01</date><risdate>2024</risdate><abstract>A substrate support configured to support a substrate in a lithographic apparatus comprising: a first circumferential wall; a first opening radially outwards of the first circumferential wall and configured to supply and/or extract gas; a second circumferential wall radially outwards of the first opening; a second opening in fluid communication with ambient pressure and radially outwards of the second circumferential wall; a third circumferential wall radially outwards of the second opening; a third opening radially outwards of the third circumferential wall and configured to extract fluid; and a fourth circumferential wall radially outwards of the third opening.</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Substrate support and lithographic apparatus |
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