A liquid target material supplying apparatus, fuel emitter, radiation source, lithographic apparatus, and liquid target material supplying method

The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a reservoir system including a reservoir configured to be connected to an ejection system and a pressurizing system to pressurize liquid target material in the reservoir, wherein th...

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Bibliographische Detailangaben
Hauptverfasser:	VERHAGEN, MARTINUS CORNELIS MARIA, WESTERLAKEN, JAN STEVEN CHRISTIAAN, DIRECKS, DANIEL JOZEF MARIA, VAN DRENT, WILLIAM PETER, DRIESSEN, THEODORUS WILHELMUS, SAMS, BENJAMIN ANDREW, WILLEMS, PETRUS ADRIANUS, TREES, DIETMAR UWE HERBERT, HEEZIUS, MARCEL JOHANNES THEODORUS, JACOBS, JOHANNES HENRICUS WILHELMUS, DERKS, SANDER CATHARINA REINIER
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	The present invention relates to an apparatus for supplying a liquid target material to a radiation source, comprising a reservoir system including a reservoir configured to be connected to an ejection system and a pressurizing system to pressurize liquid target material in the reservoir, wherein the pressurizing system comprises a device configured to transfer pressure to the liquid target material, wherein the pressurizing system is configured to apply a pressure of at least 700 bar. The invention also relates to a fuel emitter, radiation source, lithographic apparatus and liquid target material supplying method.