Sensor system

A sensor system for measuring a shape of a substrate, comprising: a substrate support to support a surface of the substrate, at least one sensor device, each sensor device comprising an optical emitter to emit radiation beams onto the surface of the substrate, and an optical receiver to receive the...

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Bibliographische Detailangaben
1. Verfasser:	KRAMER, GIJS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A sensor system for measuring a shape of a substrate, comprising: a substrate support to support a surface of the substrate, at least one sensor device, each sensor device comprising an optical emitter to emit radiation beams onto the surface of the substrate, and an optical receiver to receive the radiation beams reflected from the surface; and a controller. The controller is configured to: determine at least one measurement height of the surface of the substrate above each of the at least one sensor device, based on the received radiation beams; compensate for gravitational sag of the substrate relative to a calibration height; and determine the shape of the substrate based on a comparison of the calibration height and the at least one measurement height.