Co-Cr-Pt-oxide-based sputtering target

This Co-Cr-Pt-oxide-based sputtering target comprises 50 at% or more of Co, more than 0 at% and 20 at% or less of Cr, and more than 0 at% and 25 at% or less of Pt, with the remainder made up of one or more oxides and unavoidable impurities, the Co-Cr-Pt-oxide-based sputtering target being characteri...

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Bibliographische Detailangaben
Hauptverfasser:	WATANABE, YASUNOBU, TADOKORO, JUN, GOTO, YASUYUKI, EGUCHI, TOYOKAZU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ALLOYS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL FERROUS OR NON-FERROUS ALLOYS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TREATMENT OF ALLOYS OR NON-FERROUS METALS
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Beschreibung
Zusammenfassung:	This Co-Cr-Pt-oxide-based sputtering target comprises 50 at% or more of Co, more than 0 at% and 20 at% or less of Cr, and more than 0 at% and 25 at% or less of Pt, with the remainder made up of one or more oxides and unavoidable impurities, the Co-Cr-Pt-oxide-based sputtering target being characterized in containing (A) a composite phase in which Co, Pt, and oxides are mutually dispersed, and (B) a metallic Cr phase, and containing 10 or more metal Cr phases having an equivalent circle diameter of more than 10 [mu]m and100 [mu]m or less within an observation field measuring 1 mm * 1 mm by SEM with an observation magnification of 50 times.