Two-electrode continuous plasma processing system

A two-electrode continuous plasma processing system includes a processing chamber having a clamping device, a movement device, a first and a second electrodes, and a first and a second radio frequency power sources. When the carrier plate carries the object into a processing space of the processing...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE, YUANI, LU, CHIH-MING, YANG, CHUNIEH, TSAI, MINGAN, LIU, PINUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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