Two-electrode continuous plasma processing system

A two-electrode continuous plasma processing system includes a processing chamber having a clamping device, a movement device, a first and a second electrodes, and a first and a second radio frequency power sources. When the carrier plate carries the object into a processing space of the processing chamber, the movement device controls the second electrode to pass through the carrier plate and drive the object to move toward the first electrode, and actuates the second electrode and the clamping device to clamp and position the object. The first radio frequency power source provides the first electrode with a first radio frequency energy to control the density of plasma. The second radio frequency power source provides the second electrode with a second radio frequency energy to control the ionic energy of the plasma. Therefore, the plasma is efficiently stabilized, lowering the probability of object damage.