Method for parameter reconstruction of a metrology device and associated metrology device

Disclosed is a method comprising: obtaining measured data relating to at least one measurement by a measurement apparatus configured to irradiate radiation onto each of one or more structures on a substrate; decomposing the measured data using a decomposition method to obtain multiple measured data...

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Bibliographische Detailangaben
Hauptverfasser: PORTER, CHRISTINA LYNN, COENEN, TEIS JOHAN, HELFENSTEIN, PATRICK PHILIPP, SCHOLZ, SANDY CLAUDIA, VAN RIJSWIJK, LOES FREDERIQUE, MIDDLEBROOKS, SCOTT ANDERSON
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Disclosed is a method comprising: obtaining measured data relating to at least one measurement by a measurement apparatus configured to irradiate radiation onto each of one or more structures on a substrate; decomposing the measured data using a decomposition method to obtain multiple measured data components; obtaining simulated data relating to at least one simulation based on the one or more structures; decomposing the simulated data using the decomposition method to obtain multiple simulated data components; matching between at least a portion of the simulated data components and at least a portion of the measured data components; and extracting a feature of the substrate based on the matching of at least a portion of the simulated data components and at least a portion of the measured data components.