Sulfur-containing siloxane, composition for forming silicon-containing film containing the sulfur-containing siloxane, method for producing sulfur-containing siloxane, silicon-containing film, and method for producing silicon-containing film

The present invention provides a sulfur-containing siloxane represented by the following formula (1), wherein A1-10 are each independently a hydrogen atom, an organic group, a halogen, a siloxy group represented by OSiRaRbRc, or an amino group represented by NRdRe at their each occurrence, provided...

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Bibliographische Detailangaben
Hauptverfasser:	SHIMADA, HAJIME, UENO, YOSHIHIDE, TAIRA, GENKI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention provides a sulfur-containing siloxane represented by the following formula (1), wherein A1-10 are each independently a hydrogen atom, an organic group, a halogen, a siloxy group represented by OSiRaRbRc, or an amino group represented by NRdRe at their each occurrence, provided that A1 and A3 may together be an oxygen atom to form a cyclic siloxane, A4 and A6 may together be an oxygen atom to form a cyclic siloxane, Ra-e are each independently a hydrogen atom or an organic group at their each occurrence, Rd and Re may be bonded to each other to form a ring; and p and q are each independently an integer from 1 to 5.