Control signal route through backside layers for high performance standard cells

A cell layout that may be implemented in FinFET devices or other FET devices is disclosed. The cell layout includes a control signal route that passes from a first device into backside layers and then underneath a second device. The control signal route then routes back to topside metal layers throu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: NARAYAN, SAMBASIVAN, RAGHAVAN, PRAVEEN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A cell layout that may be implemented in FinFET devices or other FET devices is disclosed. The cell layout includes a control signal route that passes from a first device into backside layers and then underneath a second device. The control signal route then routes back to topside metal layers through inactive transistors that are implemented as via structures on the other side of the second device. Connection to the gate of the second device may then be completed through the topside metal layers. The disclosed control signal route provides a low resistance path that reduces RC delay in the devices in the cell layout.