SiC single crystal substrate

A SiC single crystal substrate of an embodiment is a SiC single crystal substrate wherein the main plane of the SiC single crystal substrate has an off angle of 0 DEG to 6 DEG to the (0001) plane in the /11 -20/ direction and an off angle of 0 DEG to 0.5 DEG to the (0001) plane in the /1 -100/ direc...

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Bibliographische Detailangaben
1. Verfasser: SHONAI, TOMOHIRO
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:A SiC single crystal substrate of an embodiment is a SiC single crystal substrate wherein the main plane of the SiC single crystal substrate has an off angle of 0 DEG to 6 DEG to the (0001) plane in the /11 -20/ direction and an off angle of 0 DEG to 0.5 DEG to the (0001) plane in the /1 -100/ direction, and includes non-MP defects wherein when the Si surface is etched in molten KOH at 500 DEG C for 15 minutes, the non-MP defects that appear by etching are hexagonal and have no core, the area of the observed etch pit of the non-MP defect is more than 10% larger than that of the observed etch pit of the TSD and is less than 110% of that of the observed etch pit of the micropipe (MP), and a transmission X-ray topography image of the non-MP defect is distinguishable from the transmission X-ray topography image of the micropipe (MP), wherein etch pits, which are identified as the non-MP defects, appear in the range of 0. 1/cm2 to 50/cm2.