Plasma processing method

The present invention provides a plasma processing method with which the number of abnormalities occurring after maintenance of a plasma processing device is reduced and a state in which work can be started on products is realized in a short time. A plasma processing method for carrying out plasma p...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	MORIYA, YUKI, HIROTA, KOSA, SUMIYA, MASAHIRO, PANDEY, ANIL, EZAKI, RYU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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