Chemically amplified positive photosensitive composition, production method for substrate with template, and production method for plated article

Provided is a chemically amplified positive photosensitive composition which forms a pattern to serve as a template in a process for creating a plated article on a substrate which comprises a metal layer on the surface thereof, said composition easily forming a resist pattern having a cross section...

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Bibliographische Detailangaben
Hauptverfasser:	OJIMA, DAISUKE, KUROIWA, YASUSHI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	Provided is a chemically amplified positive photosensitive composition which forms a pattern to serve as a template in a process for creating a plated article on a substrate which comprises a metal layer on the surface thereof, said composition easily forming a resist pattern having a cross section shape in which a large undercut is formed and footing is suppressed. This invention uses a chemically amplified positive photosensitive composition containing an acid generating agent (A) which generates an acid when irradiated using an active light ray or radiation, a resin (B) which has alkaline solubility that increases due to the activity of the acid, a sulfur-containing compound (E) containing a sulfur atom which can coordinate with the metal layer on the substrate, an acid diffusion suppressing agent (F), and an organic solvent (S), said resin (B) containing an acrylic resin (B3) which contains a specific constituent unit (B3-1), wherein the decomposition rate (%) of the acid generating agent (A) determined u