Illumination optical unit for a mask inspection system

An illumination optical unit (1) is part of a mask inspection system for use with EUV illumination light (3). A hollow waveguide (11) serves to guide the illumination light (3). For the illumination light (3), the hollow waveguide (11) has an entrance opening (12) in an entrance plane (13) and an ex...

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Bibliographische Detailangaben
Hauptverfasser:	GOELLES, MICHAEL, MATEJKA, ULRICH, DOERING, DIRK, SCHMIDT, SOEREN, KORB, THOMAS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	An illumination optical unit (1) is part of a mask inspection system for use with EUV illumination light (3). A hollow waveguide (11) serves to guide the illumination light (3). For the illumination light (3), the hollow waveguide (11) has an entrance opening (12) in an entrance plane (13) and an exit opening (14) in an exit plane (14). An input coupling mirror optical unit (10) is disposed upstream of the hollow waveguide (11) in the beam path of the illumination light (3) and has at least one mirror (IL1) for imaging a source region (6) of an EUV light source (5) into the entrance opening (12) of the hollow waveguide (11). An output coupling mirror optical unit (16) serves to image the exit opening (14) of the hollow waveguide (11) into an illumination field (4). This yields an illumination optical unit whose use efficiency for the EUV illumination light has been optimized.