Charged particle filter device, charged particle removal system and semiconductor manufacturing process

The present disclosure is directed to at least one embodiment of a filter that is configured to remove contaminants utilizing a first conductive mesh (e.g., first electrode) and a second conductive mesh (e.g., second electrode) that extends around the first conductive mesh. For example, the first co...

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Bibliographische Detailangaben
Hauptverfasser: WENG, CHIAO-LING, LIN, EN-TIAN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The present disclosure is directed to at least one embodiment of a filter that is configured to remove contaminants utilizing a first conductive mesh (e.g., first electrode) and a second conductive mesh (e.g., second electrode) that extends around the first conductive mesh. For example, the first conductive mesh may receive a first electrical signal and the second conductive mesh may receive a second electrical signal such that the first and second conductive meshes are oppositely charged from each other (e.g., the first conductive mesh is positively charged and the second conductive mesh is negatively charged). Anions that are present within the fluid or generated by an electrical field between the first and second conductive meshes may interact with the contaminants such that the contaminants are attracted to at least one of the first and second conductive meshes, respectively.