Hybrid type photomask and method of manufacturing thereof

A hybrid-type photomask and method for manufacturing thereof capable of securing stability against temperature and humidity by having a composite structure in which the mask film is firmly attached to a glass substrate in a tensioned state, thereby minimizing the amount of change due to repeated use...

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Bibliographische Detailangaben
Hauptverfasser:	JUNG, SUNG-HAK, KIM, YOU-JONG, YU, MYEONG-HUN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A hybrid-type photomask and method for manufacturing thereof capable of securing stability against temperature and humidity by having a composite structure in which the mask film is firmly attached to a glass substrate in a tensioned state, thereby minimizing the amount of change due to repeated use is disclosed. The hybrid type photomask according to the present invention includes a glass substrate having one surface and the other surface opposite to the one surface; a mask film on which a light blocking pattern is formed and seated on the one surface of the glass substrate in a state in which the light blocking pattern is aligned by tension; a first adhesive member for adhering the tensioned mask film and the glass substrate together; and a second adhesive member for fixing the adhered mask film and the glass substrate.