First holding device, third holding device, fifth holding device, conveyance system, exposure system, exposure method, and method for manufacturing device
This exposure system is able to expose a wafer conveyed from an application device that is able to apply a photosensitizer to the wafer, the exposure system comprising: a holding device that has a first holding unit that holds a first surface of a wafer conveyed from an application device; a measuri...
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| creator | SUDA, TAKAYUKI TSUJI, HIROAKI YOSHIDA, MASAHIRO MORO, MASATOSHI OCHINO, ARATA KIDA, YOSHIKI ASAI, KENTA |
| description | This exposure system is able to expose a wafer conveyed from an application device that is able to apply a photosensitizer to the wafer, the exposure system comprising: a holding device that has a first holding unit that holds a first surface of a wafer conveyed from an application device; a measuring device that includes a first measuring unit that has at least a first measurement area and is able to measure a position in a first direction on a second surface on the opposite side of the first surface of the wafer held by the first holding unit, and a second measuring unit that has at least one second measurement area different from the first measurement area and is able to measure a position in the first direction on the first surface or the second surface of the wafer; an exposure device that exposes the wafer to an energy beam; a conveyance device that conveys the wafer between the measuring device and the exposure device; and a control device, wherein the control device determines whether to convey the wa |
| format | Patent |
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a measuring device that includes a first measuring unit that has at least a first measurement area and is able to measure a position in a first direction on a second surface on the opposite side of the first surface of the wafer held by the first holding unit, and a second measuring unit that has at least one second measurement area different from the first measurement area and is able to measure a position in the first direction on the first surface or the second surface of the wafer; an exposure device that exposes the wafer to an energy beam; a conveyance device that conveys the wafer between the measuring device and the exposure device; and a control device, wherein the control device determines whether to convey the wa</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | First holding device, third holding device, fifth holding device, conveyance system, exposure system, exposure method, and method for manufacturing device |
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