First holding device, third holding device, fifth holding device, conveyance system, exposure system, exposure method, and method for manufacturing device

This exposure system is able to expose a wafer conveyed from an application device that is able to apply a photosensitizer to the wafer, the exposure system comprising: a holding device that has a first holding unit that holds a first surface of a wafer conveyed from an application device; a measuring device that includes a first measuring unit that has at least a first measurement area and is able to measure a position in a first direction on a second surface on the opposite side of the first surface of the wafer held by the first holding unit, and a second measuring unit that has at least one second measurement area different from the first measurement area and is able to measure a position in the first direction on the first surface or the second surface of the wafer; an exposure device that exposes the wafer to an energy beam; a conveyance device that conveys the wafer between the measuring device and the exposure device; and a control device, wherein the control device determines whether to convey the wa