Apparatus for processing substrate
The present invention relates to a substrate processing apparatus including: a chamber; a substrate supporting unit for supporting a substrate in the chamber; a gas injection unit including a plurality of first injection holes injecting a first process gas toward the substrate, and a gas inflow unit...
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| Hauptverfasser: | , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | The present invention relates to a substrate processing apparatus including: a chamber; a substrate supporting unit for supporting a substrate in the chamber; a gas injection unit including a plurality of first injection holes injecting a first process gas toward the substrate, and a gas inflow unit for communicating with the first injection holes and allowing the first process gas to flow in; a gas supply unit for supplying the first process gas to the gas injection unit, the gas supply unit including a gas supply connection unit connected with the gas inflow unit; and a sealing unit for maintaining sealing between the gas inflow unit and the gas supply connection unit. |
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