Plasma processing apparatus and method for manufacturing plasma processing apparatus

The invention relates to a plasma processing apparatus and a method of manufacturing the plasma processing apparatus. Provided is a technique capable of stably suppressing abnormal discharge of a member exposed in a plasma processing space of a processing container. The plasma processing apparatus i...

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Bibliographische Detailangaben
Hauptverfasser: ENDO, KENICHI, OMORI, TAKASHI, AMANO, KENJI, SUEKI, HIDEHITO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention relates to a plasma processing apparatus and a method of manufacturing the plasma processing apparatus. Provided is a technique capable of stably suppressing abnormal discharge of a member exposed in a plasma processing space of a processing container. The plasma processing apparatus includes: a processing container having a plasma processing space therein; a first member provided inside the processing container, having at least one first surface exposed in the plasma processing space, and constituting a part of the internal structure of the processing container; and a second member that is provided inside the processing container and that is in contact with a second surface of the first member that is adjacent to the first surface. The first member has an inclined surface that is a part of the first surface, is adjacent to the second surface, and forms a recess in a state in which the second member is in contact with the second surface, and at least the first surface and the inclined surface ar