Storage device and method of manufacturing switching layer
Embodiments provide a storage device capable of maintaining characteristics of a memory cell and reducing a leak current, and a method of manufacturing a switching layer. A storage device includes a memory cell including a variable resistance element and a switching element having snapback current-v...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Embodiments provide a storage device capable of maintaining characteristics of a memory cell and reducing a leak current, and a method of manufacturing a switching layer. A storage device includes a memory cell including a variable resistance element and a switching element having snapback current-voltage characteristics. The switching element includes a first conductive layer in contact with the variable resistance element, a second conductive layer, and a switching layer provided between the first conductive layer and the second conductive layer. The switching layer includes at least one switching member and a first insulating layer having a thermal conductivity higher than 1.4 W/m/K. A cross-sectional area of the switching member at a connection surface between the switching layer and the first conductive layer and a cross-sectional area of the switching member at a connection surface between the switching layer and the second conductive layer are each smaller than a cross-sectional area at a connection su |
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