A valve system, liquid target material supply apparatus, fuel emitter, radiation source, lithographic apparatus and flow regulating method

The present invention relates to a valve system for an apparatus for supplying a target material to a radiation source, said target material having a melting temperature above room temperature and being at a pressure of at least 200 bar, wherein the valve system comprises: - a chamber having a circu...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	DIRECKS, DANIEL JOZEF MARIA, VAN DRENT, WILLIAM PETER, JACOBS, JOHANNES HENRICUS WILHELMUS
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	The present invention relates to a valve system for an apparatus for supplying a target material to a radiation source, said target material having a melting temperature above room temperature and being at a pressure of at least 200 bar, wherein the valve system comprises: - a chamber having a circular cross-section, - a circular shaped valve body arranged in the chamber and matching the circular cross-section of the chamber, wherein the chamber comprises a first port and a second port, wherein the valve body is rotatable in a plane parallel to a plane of the circular cross-section about a rotation axis between an open position in which a channel in the valve body provides a flow path between the first and the second port, and a closed position in which the channel in the valve body is disconnected from at least the first port.