Lithographic apparatus stage coupling

A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the defor...

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Bibliographische Detailangaben
Hauptverfasser:	DE GOEIJ, JOHANNES ADRIANUS LEONARDUS, VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS, JANSEN, BAS, LEENAARS, RENE WILHELMUS ANTONIUS HUBERTUS, DE BRUIJN, RON GEERAARD CATHARINA
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BLASTING CINEMATOGRAPHY ELECTROGRAPHY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MEANS FOR DAMPING VIBRATION MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SHOCK-ABSORBERS SPRINGS THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	A coupling having a variable stiffness is disclosed. The coupling comprises: a deformable component and a support being movably arranged with respect to each other, wherein the deformable component comprises a viscoelastic material and wherein the support has a recess configured to receive the deformable component, wherein the deformable component is configured to deform in volumetric deformation when, in use, a force is applied to the deformable component, and wherein a shape of the deformable component and a shape of the support are configured such that the variable stiffness gradually increases as a function of an amount of the force. A stage apparatus may comprise the coupling.