Semiconductor processing tool and methods of operation

Some implementations described herein provide techniques and apparatuses for a semiconductor processing tool including an electrostatic chuck having a voltage-regulation system to regulate an electrical potential throughout regions of a semiconductor substrate positioned above the electrostatic chuc...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHOU, CHUNG-PIN, HUANG, SHENG-WEN, CHEN, YANNG, CHUANG, KAI-LIN, LIU, JUN-XIU
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:Some implementations described herein provide techniques and apparatuses for a semiconductor processing tool including an electrostatic chuck having a voltage-regulation system to regulate an electrical potential throughout regions of a semiconductor substrate positioned above the electrostatic chuck. The voltage-regulation system may determine that an electrical potential within a region of the semiconductor substrate does not satisfy a threshold. The voltage-regulation system may, based on determining that the electrical potential throughout the region does not satisfy the threshold, position one or more electrically-conductive pins within the region. While positioned within the region, the one or more electrically-conductive pins may change the electrical potential of the region.