Apparatus and method for avoiding a degradation of an optical used surface of a mirror module, projection system, illumination system and projection exposure apparatus

Mirror module (100, 300, 400) for a projection exposure apparatus (200), comprising an optical used surface (104, 303, 403), an optical measurement surface (106, 305, 405, 405'), a measurement apparatus (113, 309, 409, 409') for ascertaining the degradation state of the measurement surface...

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Bibliographische Detailangaben
Hauptverfasser:	SRORM, ARNOLDUS JAN, BECKER, MORITZ, KALLER, JULIAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Mirror module (100, 300, 400) for a projection exposure apparatus (200), comprising an optical used surface (104, 303, 403), an optical measurement surface (106, 305, 405, 405'), a measurement apparatus (113, 309, 409, 409') for ascertaining the degradation state of the measurement surface, characterized in that the mirror module (100) comprises a temperature control apparatus (108, 109) configured such that the temperature of the optical measurement surface (106, 305, 405, 405') is lower than the temperature of the optical used surface (104, 303, 403).