Molybdenum compound, preparation method of the same, composition for depositing molybdenum-containing thin film comprising the same, method for producing molybdenum-containing thin film using the composition and molybdenum-containing thin film

The present invention relates to a molybdenum compound, a preparation method of the same, a composition for depositing a molybdenum-containing thin film containing the same, and a manufacturing method of a molybdenum-containing thin film using the same. The molybdenum compound of the present inventi...

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Bibliographische Detailangaben
Hauptverfasser:	KWONE, YONG-HEE, JEON, SANG-YONG, IM, YOUNG-JAE, BYUN, TAE-SEOK, LEE, SANG-ICK, LEE, SANGAN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY ORGANIC CHEMISTRY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	The present invention relates to a molybdenum compound, a preparation method of the same, a composition for depositing a molybdenum-containing thin film containing the same, and a manufacturing method of a molybdenum-containing thin film using the same. The molybdenum compound of the present invention has excellent thermal stability, high volatility, and improved vapor pressure. Therefore, it is possible to manufacture a molybdenum-containing thin film having a uniform thickness at an improved deposition rate by employing the molybdenum compound.