Substrate processing apparatus and substrate processing method

An apparatus according to the present invention comprises a processing chamber having a processing space for processing a substrate, a support section that is accommodated in the processing space while supporting the substrate in a horizontal position, a fluid supply section that supplies a processing fluid to the processing chamber to cause the processing fluid to flow in a certain direction in the processing space, and a fluid discharge section that discharges the processing fluid from the processing chamber. The support section has a substrate-facing surface facing the lower surface of the substrate and supports the substrate in a state of being spaced upward from the substrate-facing surface, and in a path of a laminar flow of the processing fluid flowing between the substrate and the support section in the processing fluid, the downstream path located downstream in the certain direction is wider than the upstream path located upstream in the certain direction. Accordingly, when a liquid is removed from t