Substrate processing apparatus

A substrate processing apparatus (1) according to an embodiment of the present disclosure comprises a substrate rotating unit (20) and a cup. The substrate rotating unit (20) holds and rotates a substrate. The cup annularly covers around the substrate being held by the substrate rotating unit (20)....

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: AMANO, YOSHIFUMI, AIURA, KAZUHIRO
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:A substrate processing apparatus (1) according to an embodiment of the present disclosure comprises a substrate rotating unit (20) and a cup. The substrate rotating unit (20) holds and rotates a substrate. The cup annularly covers around the substrate being held by the substrate rotating unit (20). The cup includes a cup base portion (53), a first member (55), and a second member (56). The cup base portion (53) surrounds the entire circumference of the substrate rotating unit (20). The first member (55) is detachably attached to an upper end portion of the cup base portion (53), and annularly surrounds the periphery of the substrate. The second member (56) is detachably attached to at least an inner peripheral end of the first member (55), and has a hydrophobic surface (56a).