Substrate processing device, method for manufacturing semiconductor device, and program
Provided is a technology comprising: a processing chamber for processing a substrate; a gas supply unit for supplying a gas into the processing chamber; a microwave supply unit for supplying microwaves into the processing chamber; and a microwave stirring unit for stirring the microwaves by rotating...
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| Hauptverfasser: | , , |
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| Format: | Patent |
| Sprache: | chi ; eng |
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| Zusammenfassung: | Provided is a technology comprising: a processing chamber for processing a substrate; a gas supply unit for supplying a gas into the processing chamber; a microwave supply unit for supplying microwaves into the processing chamber; and a microwave stirring unit for stirring the microwaves by rotating due to a flow of the gas in the processing chamber. |
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